WIN Semiconductors Orders Vistec's SB250 E-Beam Writer
WIN Semiconductors Corp. (WIN), the leading 6" GaAs MMIC foundry from Taiwan will use the Vistec SB250 system for production of pHEMT (pseudo-morph High Electron Mobility Transistors) components on 6" GaAs wafers. These devices are primarily utilized in telecommunications and for satellite transmission applications.
WIN's 6" GaAs foundry is one of the most advanced production lines in the industry for volume production of III/V devices. This order represents a follow-on purchase of a Vistec (formerly Leica Microsystems) Shaped Beam Lithography system by WIN.
"Thanks to its fully automated operation, excellent reliability, and comprehensive on-site support by the Vistec team, the previous system could be seamlessly integrated into our production process", stated Dr. Der-Wei Tu, WIN Senior Vice President and Chief Technology Advisor.
"This second electron beam lithography system from Vistec will help us to meet not only current production demands, but also develop products featuring 100 nm gate length," Dr. Tu explained.
"We are pleased to provide WIN Semiconductors with an additional advanced lithographic e-beam tool. This again proves that our direct write technology has been validated in advanced production environment," said Wolfgang Dorl, General Manager of Vistec Electron Beam GmbH. "This order lays the basis for a further mutually beneficial and a win-win situation for both parties."
Vistec Electron Beam Lithography Group
Vistec Electron Beam Lithography Group combines Vistec Electron Beam and Vistec Lithography.
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based on shaped beam technology, which is used by leading semiconductor manufacturers and many research institutes around the world. Their innovative electron beam systems are used for microchip production and integrated optics as well as for scientific and commercial research.
Vistec Lithography
Vistec Lithography develops, manufactures and sells electron-beam lithography equipment based on Gaussian beam technology. Their electron beam systems are world-wide accepted in advanced research laboratories and universities.
The Vistec Electron Beam Lithography Group is part of the Vistec Group which consists of three business units:
- Vistec Semiconductor Systems GmbH – located in Weilburg, Germany
- Vistec Electron Beam GmbH - located in Jena, Germany
- Vistec Lithography Inc. - located in Watervliet, N.Y., USA
SOURCE: WIN Semiconductors Corporation