Wafer Process Monitor

Jeol System Technology Co LtdPM-2000 wafer process monitor (nicknamed i-CHECKER) will be used in the manufacture and development of semiconductor devices. The i-CHECKER uses EB-SCOPE technology to detect process failures that are invisible from the surface.

This in-line monitor is intended for use in the contact-hole forming process in mass-production plants. It detects changes in manufacturing processes such as residual film and abnormal bottom diameter, of high aspect ratio contact holes.

This device controls the dry etching process used for forming contact holes and via-holes. It is used as a process control tool for preventing trouble from occurring in the etching equipment.

Features of the JPM-2000

Permits non-destructive in-line detection of residual film at the hole bottom and also abnormal hole diameter.

Can output the uniformity beneath the wafer surface during hole etching

It enables the operator to quantitatively obtain a grasp of the difference between etching equipment and etching chambers

Based on the defect review SEM technology

Wafer size: Can be used with 200-mm wafers (a 300-mm wafer version is also available separately).

Inspection throughput: 50 sec to 20 minutes/8-inch wafer

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