Vistec Semiconductor Systems Lands Order With Japanese Mask Manufacturer
The order includes three each of the LMS IPRO3 and LWM 9000 SEM systems for a double-digit million Euro total amount - V the largest single order in Vistec's history. The Japanese client will standardize its production facilities around the world with these leading mask metrology systems. Some systems have already been delivered.
This newest order continues the success stories for both systems. General Manager Gerhard Ruppik explains, "Our systems are bestsellers because of their performance and reliability. However, there is also no comparable product on the market for the LMS IPRO3, and the LWM 9000 SEM is also the market leader in its segment."
Overall, already five LMS IPRO3 and more than ten LWM 9000 SEM systems have been shipped.
Designed for the 65 nm mask technology and beyond, the LMS IPRO3 was launched last year. With repeatability better than 1.5 nm (3 sigma), this system meets the increasing demands of semiconductor mask manufacturers. The design of the LMS IPRO3 combines high throughput with user friendliness. All measurement functions can be pre-programmed and taught either online or offline. The unique DEVA data analysis software enables automatic data analysis. Network capable, the system can be run – V and the results analyzed – V remotely.
A SEM-based CD measurement system for 65 nm mask technology, the LWM 9000 SEM was developed in 2004 together with Advantest, Vistec's Japanese partner. The system's long-term stability of <1 nm (3 sigma) is achieved by almost completely avoiding the effect of electron charging and substrate contamination. Further notable features are a high precision scanning stage (with a laser interferometer) and the user-friendly software developed similar to the LMS IPRO3 software, which substantially reduces user training needs for the manufacturer.
SOURCE: Vistec Semiconductor Systems