Virtual Stepper system

Features:

• Enables fast and accurate inspection of advanced masks
• Significantly reduces the number of nuisance defects
• Enables the inspection of advanced OPC masks
• Reduces unnecessary mask repair
• Reduces mask cost and manufacturing cycle time
• Offers capability for mask quality and repair assessment
• Improves mask yield

Numerical's Virtual Stepper system determines the impact of mask defects by separating true defects from nuisance defects. It provides advanced defect printability analysis and mask quality control capabilities. Virtual Stepper uses the optical images generated from an inspection tool to create a simulated image of the final wafer pattern, and then checks mask quality and analyzes printability of the mask defects.

Numerical Technologies Inc., 70 W. Plumeria Drive, San Jose, CA 95134. Tel: 408-919-1910; Fax: 408-919-1920.