Varian Semiconductor Introduces Single Wafer, High Current Tool

Gloucester, MA - Varian Semiconductor Equipment Associates, Inc. announced recently that it has introduced and shipped its new product, the VIISta HCS. The VIISta HCS is the sixth-generation, Single Wafer High Current tool that Varian Semiconductor has successfully brought to market for advanced device manufacturers. In addition to holding the number one position in overall implant market share, Varian Semiconductor is also the market share leader in the high current market segment with more than 475 systems shipped worldwide.

The VIISta HCS builds upon Varian Semiconductor's patented "Dual Magnet Ribbon Beam" architecture to further extend the Company's technology leadership. It is designed to deliver superior device performance and yield. The VIISta HCS extends device manufacturers' capability for both yield and productivity.

"At Varian Semiconductor, we continue to work closely with our customers to help them gain a competitive advantage with higher yield and lower costs. Our VIISta high current series is the industry benchmark and production tool of record at most leading-edge memory, logic and foundry manufacturers worldwide. The VIISta HCS will continue to enhance our market leadership," said Gary Dickerson, chief executive officer of Varian Semiconductor. "We thank our customers for supporting our initiatives and making us number one in total implant and number one in high current. Based on the rapid adoption of the VIISta HCS, we expect to build on our technology leadership with the introduction of this product."

Varian Semiconductor has shipped multiple VIISta HCS systems into 65nm production and 45nm development sites. The systems have been accepted into high-volume manufacturing and the Company has received additional follow-on orders from leading logic, memory and foundry chipmakers.

About VIISta HCS

The VIISta HCS delivers superior productivity on a production-proven, single wafer architecture. It is the only high current system designed to ensure both high yield and high productivity using a patented "Dual Magnet Ribbon Beam" architecture to achieve excellent particle performance, in-situ interlocked beam steering for repeatable dopant placement, and a simple one-dimensional wafer scanning endstation for the highest productivity. The VIISta HCS is a member of the VIISta suite of ion implanters -- the only production-proven single wafer platform solution for all implant segments with over 800 systems installed worldwide. For more information on the VIISta HCS, please visit our website at: http://www.vsea.com/products.nsf/docs/viistahcs.

SOURCE: Varian Semiconductor Equipment Associates, Inc.