Variable-Frequency Generator

This 3000 W variable frequency generator is designed primarily for use with 200 mm and 300 mm wafer processing equipment. The HFV-L is suitable for PVD, PECVD, etch, and other inductively coupled plasma (ICP) applications.

The generator provides flexibility though digitally-synthesized variable frequency output and microprocessor control. The output frequency range is 1.765 MHz to 2.165 MHz. Frequency tuning parameters that reside in firmware may be customized to ensure reliable operation with a variety of chamber configurations and process recipes.

Features:

2 MHz, digitally synthesized variable frequency

Load power or forward power regulation modes

3 kW output level

Internal diagnostics to verify proper operation

Standard rack dimensions with 5¼-inch height

Water cooled

Advanced Energy Industries, Inc., 1625 Sharp Point Dr., Fort Collins, CO 80525. Phone: 970-221-4670. Fax: 970-221-5583.