UV Reticle Inspection Tool

The 365UV-HR is a high numerical aperture reticle pattern inspection tool for deep ultraviolet (DUV), sub-wavelength lithography. This tool provides the advanced reticle inspection capabilities necessary for both high-volume manufacturing of 0.18-micron devices and for early development of 0.13-micron processes.

This tool provides defect detection as low as 120 nm and CD defect detection as low as 60 nm, making it a suitable tool for sub-wavelength lithography. It uses a brightfield, transmitted light, laser-scanning technology to compare patterns on the reticle with either an identical pattern on an adjacent die, or with its matching database. It is designed to inspect reticles for such integrated circuit pattern defects as pinholes, chrome spots, edge extensions and patterned writing errors. This inspection tool will be available with a data prep option for the large files associated with advanced ICs.

KLA-Tencor, 160 Rio Robles, San Jose, CA 95134. Tel: 408-875-4200. Fax: 408-434-4276.