Update of Advanced Process Control (APC) Solution Software

Semy Engineering, Inc.ering updates its Advanced Process Control (APC) solution software to SEMY-Sentinel Version 2.0. The new version responds to recent requirements in the semiconductor-manufacturing sector for applications to improve Overall Factory Efficiency (OFE).

Transparent GEM allows SEMY-Sentinel to be installed in the factories without changing the existing software communication between the automation host and the equipment.

A new capability for applying multivariate analysis has been added to SEMY-Sentinel's Statistical Machine Control (SMC) application, providing a new dimension to the application that supports automatic fault detection. In addition to a performance improvement of up to 90 percent, the SMC application has been extended to support both process specific and generic methods in addition to those based on SEMY's MiniSpec.

Several updates have been made to the Data Analysis application. The user is now able to access data directly from one or more servers in the factory, an important feature for equipment fingerprinting in factory wide installations. A new method of synchronizing the time scales of data plotted from different runs has been added to the Graphical Analysis application to provide more accurate comparisons from run to run.

Auto-notification supports all monitoring applications that detect alarm conditions. This new application allows the user to designate certain individuals or groups to receive alarm notification messages either via e-mail, pager or both.

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