Two-System Solution for Ion Implantation
Source: Applied Materials, Inc.
The Swift ion implanter is the first system in the industry to provide the doping accuracy and extended operating range required for medium current and high energy applications
Applied Materials, Inc.wift ion implanter is the first system in the industry to provide the doping accuracy and extended operating range required for medium current and high energy applications. Combined with the company's low-energy, high current Quantum product, the system completes the two-system Total Solutions approach to ion implantation for fabricating 0.1 micron and below logic and memory device designs.
The simplified two-system approach is based on the device's two distinct doping applications: "conductive" implants which are used to form the basic transistor, and "parametric" implants which adjust the transistor's operating characteristics. Quantum's low energy, high current capabilities address all conductive implant applications, while Swift addresses all parametric implant applications by supporting high energy and medium current capabilities.
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