Tosoh SMD Introduces Reduced Grain Size Cobalt Targets

Tosoh SMD, Inc. Ohio-Tosoh S1V, the global leader in target technology, introduces a new Cobalt Target with a reduced grain size and a high PTF (Pass Through Flux). These attributes contribute to better film thickness uniformity and target utilization in advanced semiconductor PVD (Physical Vapor Deposition) contact processes.

Tosoh SMD's unique manufacturing process produces a cobalt target with a HexagonalClose-Packed (HCP) target microstructure which has proven to provide better magnetic properties in the target material. The Cobalt Targets have a fine grain size of less than 75 microns which can be nondestructively tested and verified.

Tosoh SMD's Cobalt Targets have high PTF demonstrating excellent performance with lower sputtering impedance and better film uniformity. This is attributed to Tosoh's target having a PTF of greater than 60% as measured on their proprietary nondestructive measurement system. High purity 3N5 and 4N5 solder-bonded Cobalt target assemblies are available. The bond integrity is verified utilizing ultrasonic C-scan techniques.

Tosoh SMD, Inc. is ISO 9001, ISO 14000 and QS 9000 registered, specializing in advancing the technology of thin films by partnering arrangements with major sputter tool manufacturers and leading electronic device producers. Tosoh SMD is a global company providing a wide range of high purity PVD materials and accessories for the semiconductor and related markets

<%=company%>is a wholly owned subsidiary of Tosoh Corporation, a diversified international producer of chemicals and high-purity materials. Established in 1935, Tosoh Corporation has a long and successful history in the production of specialty materials, sputtering targets, silica glass, quartzware products, magneto-optical disks, and scientific and diagnostic instrumentation systems.