Thin Film Thickness Measurement Unit
A new low cost, thin-film thickness measurement tool that offers considerable performance benefits over comparable CCD-based systems is now available from MKS, Spectra Products
A new low cost, thin-film thickness measurement tool that offers considerable performance benefits over comparable CCD-based systems is now available from MKS, Spectra Products. The Thin Film Thickness Measurement (TFTM) unit is an easy to use tool designed for the measurement of thin and thick films, including both transparent and semi-transparent materials. TFTM can measure thinner films than comparable CCD-based sensors. With a film thickness resolution of 20 angstroms, it also offers improved levels of repeatability in the range of +/-1% or 4 angstroms and can be used in-situ (e.g. within a vacuum chamber) or as a standalone unit. TFTM can be used to calculate the index of refraction for both absorbing and non-absorbing materials and is capable of the simultaneous measurement of multiple thin film stacks. It can also be used to measure films of unknown thickness or uncertain composition. TFTM can measure dielectric thin films such as nitrides, oxides (silicon oxide, alumina etc.) polymer coatings and thin film absorbing materials such as silicon, polysilicon, amorphous silicon and other semiconductor materials. Spectra says that with its advanced capabilities, TFTM has a wide range of manufacturing applications including semiconductor wafers, solar cells, flat panel displays and optical coatings.
N/A, 380 Woodview Ave, Morgan Hill, CA 95037. Tel: 408-778-6060 or 800-VAC-CHECK ; Fax: 408-776-8575.
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