Thermoelectric Temperature Control Literature
Source: Advanced Energy Industries, Inc.
A new series of literature describing thermoelectric temperature control for advanced semiconductor etch applications is now available
Advanced Energy Industries, Inc. series of literature describing thermoelectric temperature control for advanced semiconductor etch applications is now available. The point-of-use (POU) systems provide dynamic temperature control for the wafer chuck and chamber walls. The product line also includes systems that can provide process advantages for wet etch and track applications. Precise temperature control in real time
No temperature drift
Compact design
Small footprint
High reliability
Solid-state operation with only one moving part
Process flexibility
Low power usage
High tool up-time
Environmentally friendly operation
POU System Benefits
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