Surface Preparation PEP Iridia
Source: Novellus Systems Inc.
The Novellus PEP Iridia™ integrates production-proven technologies to offer high-throughput implant strip and post-etch clean process solutions
The Novellus PEP Iridia™ integrates production-proven technologies to offer high-throughput implant strip and post-etch clean process solutions. Iridia's Directional Downstream Plasma source is comprised of a directional RF source paired with a versatile, downstream microwave source. The integrated lamp module with state-of-the-art, closed-loop wafer temperature control enables multi-temperature processing in a single chamber. Designed for aggressive fluorine and reducing chemistries, the Iridia offers unsurpassed flexibility in handling your production needs, including high dose implant strip (HDIS), Front End of Line (FEOL) cleans, and post-etch cleans for aluminum and copper interconnects.
Novellus Systems Inc., 4000 North First Street, San Jose, CA 95134. Tel: 408-943-9700; Fax: 408-943-3422.