Surface Preparation GAMMA 2100
Source: Novellus Systems Inc.
The Novellus GAMMA 2100 is a six chamber photoresist removal system using an Interlaced Inductively Coupled Plasma (I2CP) source
The Novellus GAMMA 2100 is a six chamber photoresist removal system using an Interlaced Inductively Coupled Plasma (I2CP) source. The system utilizes single wafer process control for six stations within the same chamber allowing multi-step sequential processing at significantly higher throughput than the competition. With low power and low ionization, the GAMMA 2100 provides a perfectly uniform plasma for optimum resist removal.
Novellus Systems Inc., 4000 North First Street, San Jose, CA 95134. Tel: 408-943-9700; Fax: 408-943-3422.
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