Sputter Process Monitor
- On-line monitoring of sputtering processes up to 1 x 10-2 mbar
- Immediate detection of problems for lower defect rates
- Active process gas control
- Push button software operation with user programmable interface
The compact SPM 200 Sputter Process Monitor is based on the Balzers powerful Prisma residual gas analyzer for the verification and control of reactive semiconductor deposition processes. It analyzes the residual gas before starting the process, and during the process it determines the major gases in the percentage range, tracing gases down to the ppb range simultaneously. The distinctive triangular shaped Prisma incorporates the analyzer head and electronics into a single compact unit that easily adapts to existing process tools. The Prisma analyzes residual gases in situ, providing early detection of potential vacuum system problems, such as vacuum leaks, contamination and trace gases present.
The Balzers Quadstar software package operates under Windows to allow quantitative on-line gas analysis, complete control of Pfeiffer Vacuum, Inc. and Prisma, and communication with the process tool computer. Simple, push-button, pre-programmed operation generates error messages whenever predefined process windows are exceeded. For statistical evaluation, later reference and troubleshooting, data from each process is recorded and can easily be retrieved.
For integration into a cluster tool, Pfeiffer Vacuum, Inc. with onboard electronics is connected to a PC via a fiberoptic local area network for fast, interference-free communication over long distances. Multiple sensors, including Pfeiffer Vacuum, Inc. and Prisma, are easily integrated in one multiplexing network.
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