Spray System

Featured at Semicon Europa

FSI International introduces a 300mm-capable Zeta spray system designed for semiconductor wafer cleaning applications. The Zeta system includes an eight chemical flow system for improved process programming flexibility. The controls on the ZETA chemical flow system enable a wide range of chemical blend ratios, including dilute chemical blending ratios for RCA cleans and HF on-line blending. Benefits include not only a wider variety of process applications, but also lower chemical and DI water consumption, which reduces production costs for pilot and production fabs.

The Zeta system will accommodate either front opening unified pods or open cassettes of 15-25 wafers and automatically transfer them to spray-compatible process cassettes. Automation eliminated operator-induced handling defects and enhances the production efficiencies and process capabilities of the system.

FSI International. 322 Lake Hazeltine Dr., Chaska, MN 55318. Contact: 612-448-8066.