Product/Service

Sirus

Source: Trion Technology
Table Top Reactive Ion Etch Systems
Table Top Reactive Ion Etch Systems

The Sirus Reactive Ion Etching (RIE) system is designed to etch dielectrics and other films which require fluorine-based chemistries.

The system has been designed to meet all safety and etching requirements in the laboratory environment. Its modular design provides the engineer with a turnkey system that meets all safety, facility and processing needs. The Sirus's flexibility and innovations are a major reason for Trion Technology's success.

Applications
Processes have been thoroughly developed for anistrophic etching of silicon dioxide, silicon nitride, and other materials requiring high selectivity and a controlled anistropic etch. Our demonstration lab is available to process samples and develop etch processes for net materials.
System specifications: 35"Wx26"Dx48"H
RF Power: 300 watt, 13.56 MHz
Up to 4 Mass Flow Controllers
Maximum wafer size: up to 6"

Trion Technology, 1025 South 52nd Street, Tempe, AZ 85281. Tel: 480-968-8818; Fax: 480-968-5596.