SIRD

The scanning infrared depolarization measurement represents an indispensable method for quality management and yield improvement in semiconductor technology. The in-line capable technique measuring on product wafers covers tasks in:

• Process control
• Process tool control
• Defect monitoring and screening
• Quality management

• Defect screening and wafer sorting in early stages of wafer manufacturing
• Slipline control in case of rapid thermal annealing procedures
• Monitoring of temperature gradients by induced stress evaluation
• Monitoring of technological procedures during wafer design
• Fracture prevention
• Final quality testing

• Input control and sorting
• Slipline control for high temperature processes
• Fracture prevention
• Control of process induced stress mainly in RTP, ion implantation, diffusion and epitaxy
• Trouble shooting

Tepla Inc. , 1321 Valwood Parkway, Suite 400, Carrollton, TX 75006. Tel: 972-247-0053; Fax: 972-247-0405.