Semitool and IMEC will Enhance Ozone-based Cleaning Applications

Semitool, Inc. and IMEC recently announced the signing of a collaboration agreement that will focus on enhancing Semitool's patent pending HydrOzone ozonated water process for advanced cleaning applications through the development of new technology and implementation of IMEC's proprietary patented ozone-based cleaning technology.

The removal of sulfuric acid and hydrogen peroxide from the manufacturing process reduces manufacturing costs by eliminating chemicals and their disposal costs, and significantly reducing deionized water usage. Ozonated water processes also have the potential for providing enabling technology for advanced device generations by replacing or reducing reliance on current manufacturing technologies. Typical applications are removal of organic contaminants and photoresist stripping.

IMEC is Europe's leading independent research center for the development and licensing of state-of-the-art microelectronic technologies.

Semitool is a leading semiconductor equipment manufacturer providing equipment and process solutions in wet chemical cleaning, etching and electrochemical deposition of metals.

For more information: Bill Freeman. Tel: 406-752-2107.