Product/Service

Semiconductor Ion Implantation

Source: Implant Sciences Corporation
Implant Sciences is a reliable, cost effective source for semiconductor ion implantation.
Implant Sciences is a reliable, cost effective source for semiconductor ion implantation. From special ion implantation services that help you with your product development program-to fast turnaround production implants, we provide high quality implants at competitive prices. In each case, experienced engineers work closely with you to ensure that your requirements are met in a timely, cost effective manner.

We offer a broad range of ion implantation capabilities including:

  • Energies from 3-400 keV
  • Doses from 1 E10-1 E18 ions/cm2
  • Class 100 clean room facility
  • 0°-15° tilt angle
  • 2"-6" wafer diameter
  • Heated implants to 1100°C
  • LN2 temperature implants
  • Isotope separation for SIMS standards
  • MIL spec 9858A, 45662A, 105D, and 45208 approved

    Whether your research calls for gallium arsenide dopants, rare-earth species, or transition/noble metals, our specialty is meeting even the most unusual requirements. In addition, Implant Sciences' experienced technical personnel are available for no charge consultations and process modeling.

    The rare-earth and noble metal ions are generated using a proprietary ion source which produces high currents of these ion beams. A specially designed end station accommodates odd-shaped samples. Wafers can also be ion implanted while held at high temperatures within a tube furnace or mounted on a LN2 cooled dewar.

    Implant Sciences Corporation, 107 Audubon Road, Suite 5, Wakefield, MA 01880. Tel: 781-246-0700; Fax: 781-246-1167.