Product/Service

RT-8200 Reticle Inspection System

Source: Applied Materials, Inc.
The RT-8200 system features a second image processing channel and new camera with twice the pixel density as the earlier RT-8000ES

The RT-8200 system features a second image processing channel and new camera with twice the pixel density as the earlier RT-8000ES, plus a new computing architecture and user interface. Doubling the scan speed of the earlier model, the system provides two times the increase in throughput and reduced reticle inspection cost.

Featuring a Sun UltraEnterprise 450 computer powered by dual 64-bit 250MHz processors and Solaris operating system, plus extensive memory capacity, the RT-8200 handles very large data densities for industry-leading productivity, even at high sensitivities. The system is optimized to handle Phase Shift Masks and Optical Proximity Correction reticles with maximum sensitivity and accuracy.

Since the reticle's pattern is projected by lithographic equipment to form the circuit pattern in each layer of an integrated circuit, the reticle's precision directly affects the accuracy of the circuit. As semiconductor geometries shrink, the size of critical defects on the reticle decreases, making defect detection increasingly difficult. For these reasons, reticle inspection is a key step in maintaining performance and yield of advanced semiconductors.

Applied Materials, Inc., 3050 Bowers Ave., Santa Clara, CA 95054-3299. Contact: Wolf Staud, 408-563-1088.