Rolling Diaphragm Valve

Featured at Semicon West

Furon Co. announces the introduction of the RDV-1000 Furon Rolling Diaphragm Valve for use in semiconductor process, high purity, and corrosive chemical applications. The RDV-1000 also supports a design that is suited for plug and play customized manifold configurations for use in CMP, photo resist and chemical distribution and delivery systems. It is especially suited to long life in resist and slurry delivery systems due to its patent pending rolling diaphragm technology.

The RDV-1000 is available with 1-in. ports in a range of end connections and comes in two configurations: a two-way pneumatically actuated valve and a two-way manually operated multi-turn valve. The Furon Rolling Diaphragm Valve is constructed of High Purity PTFE and is assembled, tested, and double-bagged in a Class 100 Cleanroom.

Other features of the new valve include a leak detection port, visible position indication, no exposed metallics, and back pressure capability equal to forward pressure ratings. The manually operated multi-turn RDV-1000 can adjust flow rates for volumetric control in process applications with its throttling and soft closure capability.

Furon Co., Tel: 1-800-GO-FURON.