RF Plasma Source

The Delta Glow family of high density plasma sources improve the quality of thin films by reducing contaminants and deposited film inclusions.

The plasma sources are designed to generate dense gas plasma for thin film deposition, etching, and material surface modification applications. These applications include vacuum chamber conditioning and cleaning, PECVD, polymer material surface treatments and in-situ enhancements of the thin film deposition process. It also enhances the activation and removal of water vapor from chamber walls and substrate surfaces that conventional heating methods are unable to achieve.

The plasma source reduces oxygen contamination that conventional diagnostic techniques fail to detect and remove. When the high energy plasma source is used to clean a vacuum system, the bombardment of system surfaces with electrons and ions stimulates desorption of water bonded to systems surfaces, resulting in a cleaner system with less film contamination during subsequent processing.

The Delta Glow product family consists of three different models, each with its own high efficiency RF power delivery system. It also runs with an existing RF power system. The vacuum chamber interface is a standard ISO type flange or a custom interface plate. Process gas enters the reactor tube via a VCR fitting. A standard quartz reactor tube is the only consumable; however, aggressive fluorine-based processes may require the use of an optional alumina or sapphire reactor tube.

Manitou Systems Inc., 12 South St., Danbury, CT 06810. Tel: 203-792-8797. Fax: 203-792-7097.