Reticle Inspection Tool

KLA-Tencortar is a reticle inspection tool capable of delivering comprehensive detection of all types of particle, contamination and pattern defects on multi-die pelliclized reticles. The tool provides a three-fold increase in throughput compared to previous inspection platforms and can detect defects as small as 100 nm. It is a suitable tool for pre- and post-pelliclization inspection in photomask manufacturing operations, as well as for incoming quality control (IQC) and re-qualification in wafer fabs.

This high-throughput tool is designed to inspect the multi-die pelliclized reticles used for manufacturing application specific integrated circuits (ASICs) and high-volume integrated circuits (ICs).

The tool uses a beam-splitting technology to provide multi-beam UV reticle inspection capabilities, and incorporates an image computer that enables the use of Tera algorithms to provide high-sensitivity, die-to-die pattern inspection. It can conduct simultaneously transmitted and reflected (STAR) light inspection for contamination with concurrent die-to-die pattern inspection for detection of pattern defects on the chrome surface of reticles, improving the throughput of the tool by three- to six-fold compared to previous generation STARlight 300-Series tools. The tool detects defects on both the pellicle surface and backside of reticles in a single operation.

The tool can inspect a standard 6-inch reticle in less than one hour. For less critical layers on the reticle, it can provide inspection at better than 20 minutes per reticle.

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