Reticle Inspection Tool

KLA-Tencortar reticle inspection tool delivers comprehensive detection of all types of particle, contamination and pattern defects on multi-die pelliclized reticles. The tool is the newest evolution of the company's STARlight technology. The system provides a three-fold increase in throughput compared to previous inspection platforms and can detect defects as small as 100 nm. The tool is suitable for pre- and post-pelliclization inspection in photomask manufacturing operations, as well as for incoming quality control (IQC) and re-qualification in wafer fabs.

This high-throughput tool designed to inspect the multi-die pelliclized reticles used for manufacturing application specific integrated circuits (ASICs) and high-volume integrated circuits (ICs).

The system uses a beam-splitting technology to provide multi-beam UV reticle inspection capabilities, and incorporates an image computer that enables the use of Tera algorithms to provide high-sensitivity, die-to-die pattern inspection.

It can conduct simultaneously transmitted and reflected (STAR) light inspection for contamination with concurrent die-to-die pattern inspection for detection of pattern defects on the chrome surface of reticles.

<%=company%>, 160 Rio Robles, San Jose, CA 95134. Tel: 408-875-4200