Resist Processing System
Source: FSI International, Inc.
The Polaris 3500 Microlithography Cluster is designed for 300-mm wafer processing
The Polaris 3500 Microlithography Cluster is designed for 300-mm wafer processing. The tool is targeted at 0.15 micron design rule applications. It is based on a common platform that uses the same wafer handling system, environmental control system and software.
This tool allows users to move to 300-mm processing without the risk in starting over on unproven, scaled-up track designs. The small footprint of this tool is another key benefit of its 200-/300-mm design.
FSI International, 322 Lake Hazeltine Drive, Chaska, MN 55318-1096. Tel: (612) 448-5440. Fax: (612) 448-2825.
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