Reactive Ion Etching System

Highly selective anisotropic etching. Fully automatic 'one button' operation with full manual override. Easy-to-use computerized touch panel for parameter control and recipe entry and storage. Processes wafers up to 8 inches in diameter. Sleek, compact design uses minimal cleanroom space.

Capable of storing 10 recipes and run up to four steps per recipe.

SAMCO's RIE-10NR is a low-cost, high-performance, fully automatic, dry etching system which meets the most demanding process requirements and can be configured for both flourine and chlorine chemistries. Etching is performed with minimal sidewall deterioration and a high selectivity between mateials.

SAMCO International, Inc., 532 Weddell Drive, Suite 5, Sunnyvale, CA 94089. Tel: 408-734-0459; Fax: 408-734-0961.