Product/Service

PVD System - Eclipse Mark IV

Source: Tokyo Electron America, Inc.
The Eclipse Mark IV is the latest generation PVD tool to evolve from the highly successful Eclipse family. The system offers the lowest Cost-of-Ownership through high throughput, a small footprint, and high reliability with exceptional process performance...
The Eclipse Mark IV is the latest generation PVD tool to evolve from the highly successful Eclipse family. The system offers the lowest Cost-of-Ownership through high throughput, a small footprint, and high reliability with exceptional process performance.

The Eclipse Mark IV is a unique PVD system. It achieves high throughput in a high vacuum environment through the use of serial wafer handling. Wafers enter the high vacuum region and are clamped only once. Five assemblies are then simultaneously rotated between isolated vacuum chambers in one transfer motion. Non-productive transfer time is shared between the five wafers. This ensures the highest productivity for a given process time. This handling scheme results in 80% fewer wafer transfers than a traditional cluster tool - ensuring more reliable wafer handling.

The Eclipse Mark IV footprint is 44 square feet. Wafers are horizontal in the front half of the system where they are optically aligned and centered before being transferred to a vertical orientation. The wafers then enter the high vacuum region and are serially transported between the four chambers. This architecture ensures the smallest footprint possible by utilizing the vertical space of the cleanroom for wafer processing.

Each isolated vacuum chamber is identically sized. They can be configured for etch or deposition. A range of deposition sources exists to provide full capability for today's contact, barrier, interconnect, resistor, and packaging films for Silicon, GaAs and CCD substrates. This flexibility in design ensures the system is extendable to future processes with minimal configuration changes.

Wafer temperature is regulated by backplane heaters. The chambers have world class vacuum leak rates and base pressures. Maximum uniform target erosion is achieved with process optimized cathode magnet packs. Shield material is designed to reduce particles and extend life. This combination of hardware provides uniform, consistent, particle free process performance in high volume manufacturing, allowing the Eclipse Mark IV to be identified as Best of Breed by our customers.

Tokyo Electron Arizona provides world class service and training to support the Eclipse. Ninety percent of our staff has over five years experience with the product. This level of experience brings added value to your team.

Tokyo Electron America, Inc., 2400 Grove Blvd., Austin, TX 78741. Tel: 512-424-1000; Fax: 512-424-1034.