Product/Service

PVD Barrier Module

Source: Trikon Technologies
An ionized Physical Vapor Deposition (i-PVD) module has been introduced that extends the use of all-PVD liner solutions to sub 150nm design rules
Trikon Technologiesnized Physical Vapor Deposition (i-PVD) module has been introduced that extends the use of all-PVD liner solutions to sub 150nm design rules. Deposition of both Ti and TiN by i-PVD offers high base and sidewall coverage of liner materials into narrow structures. The ability to use very thin field layers reduced over-polish at the next CMP metal step, cutting down on yield-reducing oxide erosion.

In the new barrier deposition system, Ti and TiN are deposited in the same module, maximizing process flexibility and minimizing cost of ownership.

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