Producer CVD System
Integrated metrology enables chipmakers to precisely track the characteristics of each film on every wafer rather than sampling wafers only at long specified intervals. Integrated measurement capability is expected to be even more important with 300mm wafers in dramatically reducing or eliminating costly monitor wafers.
The Producer's NanoSpec unit is fully programmable to inspect a range of designated wafer types, including specific wafers identified by fab management systems. Measurement data can be used to manage yield, improve operator efficiency and quickly detect any process excursions. It also features statistical process control capabilities, aids in more rapid process modeling and diagnosis, and speeds system re-qualification after maintenance.
The Producer platform can accommodate up to three Twin Chamber process modules. Wafers are transferred in pairs to each module which contains two identical single-wafer process chambers. Each Twin-Chamber module shares many common subsystems, such as vacuum and gas delivery, while retaining individual power and other process parameters needed for superior process control. The system's broad portfolio of processes covers virtually every kind of blanket dielectric CVD application.
<%=company%>, 3050 Bowers Avenue, Santa Clara, CA 95054-3299. Tel: 408-727-5555. Fax: 408-748-9943.