Polysilicon Slurry

The Semi-Sperse P1000 is the first in a family of polysilicon slurries that feature a high selectivity rate. This slurry is specifically designed for use in the manufacture of leading-edge devices such as 256 megabit and faster DRAMs.

The high oxide-to-silicon nitrate selectivity rate is more than 300 to one. It has a surface finish of three-anstrom roughness making it suitable for polishing polysilicon plugs and exposed polysilicon vias after chemical vapor deposition. These capabilities are also suitable for emerging process requirements such as polysilicon damascene polishing.

This slurry offers post-CMP clean and high colloidal stability with a shelf life of more than 12 months. The surface finish, high selectivity to oxide and low defectivity rates of this slurry contribute to higher yields for chipmakers, according to the company.

Cabot Corporation, 500 Commons Drive, Aurora, IL 60504. Tel: 630-585-9471. Fax: 630-585-9976.