Polishing Slurry for Advanced Rigid Disk Substrates

The new Lustra 3010 polishing slurry for rigid disk substrates is designed to improve throughput, while maintaining low defectivity and high yields on advanced rigid disk substrates.

The slurry was developed to offer increased data storage capacity and lower costs per megabyte. The manufacturer states that lower costs result from the throughput advantage created by a higher polish rate. In addition, the manufacturer also states that the new slurry has enabled some customers to go to a single-step polish process. This machine was developed in direct response to customer demand for higher throughput, optimum surface quality, improved defectivity, outstanding finish and the reduction of microscratches and micropits.

Cabot Microelectronics Corporation, 500 Commons Drive, Aurora, IL 60504. Tel: 630-585-9471. Fax: 630-585-9976.