Plug and Play Photochemical Filtration
The filter instantly wets in photochemical solutions, eliminating the need for pre-wetting or purging. It also does not de-wet in solvent-based photoresist solutions. The filter delivers low-particle-on-wafer performance for advanced I-line and DUV processes. The membrane structure and device minimize gel breakthrough, resulting in superior gel retention. The membrane, which is compatible with most of the photochemical solutions, will not generate microbubbles downstream of the filter. A form fitting housing lowers hold-up volume, only 55 cc versus 150-200 cc for cartridges. The filter is compatible with most organic solvents except aromatic hydrocarbons.
<%=company%>, 80 Ashby Road, Bedford, MA 01730. Tel: 781-533-6000. Fax: 781-533-3301.