Plasma Source

Featured at Semicon West

GaSonics International announces the introduction of the Stinger source, a new plasma source for GaSonics' line of Performance Enhancement Platform (PEP) systems. Utilizing the same microwave source technology featured in GaSonics' Millennia 300 mm integrated clean system, the Stinger offers chipmakers lower cost of ownership, higher removal rates and higher throughput for 200 MM photoresist, residue removal and isotropic etch applications.

At the core of the Stinger source is a proprietary power applicator developed in cooperation with Oakridge National Labs. The applicator, which is currently used in GaSonics' PEP photoresist removal system, is used in conjunction with a tuned cavity to deliver microwave power uniformly over a larger area of the plasma chamber. As a result, more energy is available for active species generation than prior generation hardware, thus improving efficiency by more than 20% and enabling higher removal rates. In addition, the source is capable of delivering 3 kW of power to generate much higher removal rates or maintain the same rates at lower temperature, which is critical for temperature-sensitive process steps involving copper, low k dielectrics or implanted resist.

The Stinger's core technology has already been qualified for 0.18µ. It is also proven for 300 mm applications, resulting in a 5 µ/min. removal rate of DUV resists with less than or equal to 5 percent within wafer uniformity. The new source will be available on all new PEP systems.

GaSonics International, 2540 Junction Ave., San Jose, CA 95134. Tel: -408-570-7400.