Photronics and IMEC will Develop Photomask Manufacturing Technologies

Photronics, Inc. (Danbury, CT) and IMEC (Leuven, Belgium) recently announced a cooperative agreement to explore and develop photomask manufacturing technologies and processes needed to produce integrated circuits with features down to, and below, 130 nanometers. A key area of focus will be determining reticle technology requirements for the fabrication of semiconductors using 130 nanometer design rules being produced with 193 nanometer wavelength exposure sources in wafer lithography systems.

Specific areas of joint research will include: the enhancement of critical dimension uniformity on the wafer via optical enhancements on the reticle; the evaluation of available materials and manufacturing systems; the testing of available reticle inspection tools and repair systems; the use of wet and dry etch process technologies; identifying the limits of optical CD metrology technologies; and defect printability at and below the 180 nanometer technology node.

Photronics is a leading worldwide manufacturer of photomasks.

IMEC is an independent research and development organization that develops advanced microelectronics technology.

For more information: Michael W. McCarthy, Photronics. Tel: 203-775-9000