Product/Service

Photomask Inspection System

Source: QC Optics, Inc.
The API-5000 is a new photomask inspection system that nearly eliminates repeating defects by inspecting the reticle prior to every photolithographic process
QC Optics, Inc.0 is a new photomask inspection system that nearly eliminates repeating defects by inspecting the reticle prior to every photolithographic process. This inspection tool supports sub- 0.15 micron design rules and offers IC makers an affordable and reliable option when selecting a high performance, high detection rate inspection tool.

QC Optics, Inc.0, the newest member of QC Optics' FLS (Fast Laser Scanning) product series, is compatible with advanced reticles, such as phase shift, "Tri-tone" and optical proximity correction (OPC) masks. The tool makes no requirement of its operator to have knowledge of the reticle pattern, chrome reflectance, pellicle thickness, or any other data. By inspecting less critical layers with less stringent defect criteria using lower sensitivities, the tool can achieve throughputs as fast as 8 minutes per reticle.

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