Peak Temperature Monitor Wafers

N/A(Arrays of Peak Temperature Indicators) monitor wafers are non-contaminating, non-invasive wafers provide an approach to permanent, accurate peak wafer temperature indication for plasma etch processes. Temperature-indicating sensor arrays, located as close as 3mm from the wafer edge, are embedded in the wafer and sealed under sapphire windows. They autoload and process like product wafers without system downtime or risk of arcing or chamber contamination.

Processes can be routinely checked at the wafer to verify that actual wafer temperatures are within process limits. Temperature uniformity measurements from 40°C to 121°C with resolution to 4°C correlate with the company's APTOS real-time in situ plasma temperature measurement systems.

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