pCMP Products

Avantor Performance Materials, Inc.0 and pCMP-850 cleaners remove slurry particles and trace metals from substrates after CMP processing and prevent redeposition on substrate surfaces.

Buffered to maintain a constant pH over a wide range of dilutions and operating temperatures, both products are designed for compatibility with copper damascene processing and low k dielectric substrates. Both products are also compatible with SiO₂, Al and W substrates, providing easy transition from transition from existing Al to next-generation Cu technologies.

Avantor Performance Materials, Inc.0 is ideal for efficient cleaning in the shorter exposure times of most spray and brush systems. The pCMP-850 is designed for gentler cleaning of more sensitive substrates in spray, brush or longer-exposure bath processes. Both products are compatible with common materials of construction including PVA brushes.

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