Ozone-Deionized Water (O3 -DI) Process

CFM's Ozone-Deionized Water (O3 -DI) Process can be integrated into a variety of aqueous applications where ozone (O3 ) is known to have process advantages. These processes include light organic or polymer removal or other organic and inorganic oxidizing applications. Many other processes utilizing O3 -DI, sometimes in combination with other chemicals, are under investigation across the industry.

Ozone is a very aggressive oxidant that can be used to replace other oxidizing chemistries, including Sulfuric Peroxide Mixtures or Sulfuric Ozone Mixtures, particularly for light organic cleaning.

Ozone dissolved in water can also be used as a replacement for hydrogen peroxide in HCl Peroxide Mixture, reducing the cost of chemicals used while at the same time shifting the oxidation potential to higher oxidizing values. Other applications for CFM's O3 -DI include post-HF treatment, where the O3 -DI acts as the oxidizing agent in silicon oxide regrowth. Because of its high oxidation potential, exposure to ozone can be hazardous for fab personnel and equipment. It is therefore important to use O3 -DI in systems where chemicals are completely contained and exposure is eliminated.

CFM's O 3 -DI System
In the O3 -DI System, CFM continues its tradition of reliable, reproducible, single-pass chemical use. Concentrated ozone dissolved in water is prepared in a 17-gallon (50 liter) tank to a minimum concentration of 45ppm. This concentrated liquid is then injected into a flowing stream of DI water to a controlled concentration and into the CFM enclosed processing chamber. Concentration, temperature, flow rate and exposure time are recipe selectable and can occur at the touch of a button.

CFM Technologies, Inc., 150 Oaklands Blvd., Exton, PA 19341. Tel: 610-280-8300; Fax: 610-280-8309.