Orion Compact Quadrupole Mass Spectrometer for PVD Process Monitoring

MKS Instruments, Inc. introduces the Orion Compact Process Monitoring System with a closed ion source quadrupole mass spectrometer and integrated turbomolecular pump for in situ monitoring during physical vapor deposition (PVD). The Vacuum System Controller (VSC) for the integrated differential pumping system and the Compact Orion Controller are combined into a single on-board unit, which simplifies installation, provides higher reliability, and minimizes space requirements. The integrated control system mounts directly on the mass spectrometer and requires no additional electronics rack space. The Orion Version 4.3 software has several unique features that enhance integration with the process tool and process, including data binning, multi-event gas species-specific alarms, automatic recipe selection, and advanced SECS-II/GEM compatibility.

Three mass ranges are offered: 1-100 amu, 1-200 amu, and 1-300 amu. The Compact Orion PVD system can directly monitor at process pressures up to 3 mTorr with ppb-range sensitivity. PVD monitoring at higher pressures can be done via an easily customized orifice; base pressures can still be directly monitored at high sensitivity via automated sample port selection.

The Compact Orion PVD is used in single-chamber tools as well as on cluster tools, providing continuous in situ monitoring of sputter process chambers. The complete electronic and vacuum control unit is located on the sensor head with a direct connection to the host computer and runs on the field-proven Orion process monitoring software. The Orion software is easy to use and offers recipe-based operation for procedures from simple residual gas analysis to complex process monitoring.

N/A, Six Shattuck Road, Andover, MA 01810. Tel: 978-975-2350; Fax: 978-975-0093.