Orion

The Orion is the first Plasma Enhanced Chemical Vapor Deposition (PECVD) system in our industry that produces production quality films at an affordable price. The Orion's unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The Orion has been designed to meet all safety and equipment needs for use in the laboratory and pilot production environment. Its small modular design, built-in gas cabinet and sophisticated computer control system provide the user with a turnkey system that can easily meet your safety, facility and processing needs.

Applications
The Orion has been characterized for both Nitride and Oxide deposition. If the user does not wish to use Silane as the main process gas, we have developed processes for TEOS oxide and DES nitride deposition. Both reactions are generated from liquid sources, and eliminate the need for pyrophoric gases. Trion Technology supplies one liquid source canister with each system, free of charge.

By using TEOS and DES in place of SiH4 the user is eliminating a major safety issue that often prevents labs from pursuing PECVD deposition. By incorporating the load-lock, computer controlled gas cabinet, AC distribution panel and the basic deposition reactor into one complete system, the Orion PECVD system can be facilitized in any area, at a substantial cost savings compared to other PECVD systems. This low installation cost, combined with the superior process results achieved on the Orion system, make it an easy choice for buyers looking at the total cost they will have to spend to purchase and install a PECVD system.

System specifications: 35"Wx26"Dx48"H
RF Power: 500 watt, 13.56 MHz
Up to 6 Mass Flow Controllers
Maximum wafer size: up to 8"

Trion Technology, 1025 South 52nd Street, Tempe, AZ 85281. Tel: 480-968-8818; Fax: 480-968-5596.