Optical Proximity Correction (OPC) Physical Design Tool

Numerical Technologies Inc.ptimizes optical proximity correction for subwavelength masks. This product includes silicon vs. layout verification capability to verify the layout of a subwavelength IC against the silicon it is intended to produce. This approach utilizes a selection engine that divides the design into those areas that are best suited for a rule-based approach and those that are best suited for a model-based approach. The product makes the determination based upon built-in intelligence (heuristics) that considers location, geometry style, and density of the regions of the IC, or by user-defined scripting. Then the rule-based and model-based OPC engines are run "in tandem" to apply the optimal amount of OPC to the various areas. It can also run in an all-rule or all-model-based mode if the design is suited to a single approach.

The corrected design is then verified using the silicon vs. layout verification engine for a final check. The layout is simulated against the various process effects, such as optical, chemical and etch effects. The simulated silicon image is then compared with the intended layout. If further correction is needed, it can be completed through the model-based OPC engine.

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