n&k Technology Announces Metrology System For Photomasks

Santa Clara, CA -- n&k Technology, Inc., a manufacturer of advanced metrology equipment, has announced its photomask system that combines the capabilities of a CD-SEM, a DUV dual-beam laser-interferometer, and a spectroscopic ellipsometer into a single unit. The announcement was made at the recent SPIE BACUS Symposium.

This latest tool from n&k, called the n&k 5700-CDRT, simultaneously furnishes polarized reflectance (R) and transmittance (T) spectra in the DUV-Vis-NIR wavelength range, while the previous generation, the n&k 3700-RT, utilized unpolarized light. "With this unique R and T simultaneous measurement feature, trench depth, CD, and profile measurements of photomasks are greatly enhanced," explained Dr. Rahim Forouhi, founder and president of n&k Technology. "For example, trenches as deep as 35 microns, with an approximate pitch range of 100 nm to seven microns are accurately measured for 2D and 3D structures with the n&k 5700-CDRT."

Correlation studies demonstrated linearity between the optical CD measurements of the n&k 5700-CDRT and those taken with a CD-SEM. The system also exhibits correlation of phase-shift measurements with interferometer output at both 193 and 248 nm for a variety of trench structures and materials.

The n&k 5700-CDRT measures both blank and patterned photomasks. It also provides film thickness, values of n and k, and phase-shift of MoSiON, even with the presence of a chrome layer. Measurements are fast and non-destructive, with exceptional repeatability and reproducibility.

The company has received multiple orders for the n&k 5700-CDRT from a major Korean semiconductor manufacturing company. Delivery began in the fourth quarter 2005 and will continue in the first quarter of 2006.

SOURCE: n&k Technology, Inc.