New at Semicon Europa: Excimer Laser
Source: Cymer, Inc.
The ELS-6010 KrF excimer laser for lithography provides optical performance applicable to 130 nm semiconductor manufacturing
Cymer, Inc.0 KrF excimer laser for lithography provides optical performance applicable to 130 nm semiconductor manufacturing. With a highly line-narrowed bandwidth of 0.5 pm at FWHM and 1.4 pm at 95% energy, Cymer, Inc.0 enables full imaging performance from lithography steppers or scanners using lenses with NA over 0.75. The laser has 20 W maximum average output power. Operating at high frequency pulse repetition rate means more pulses can be delivered in a single exposure, which improves the dose stability at the wafer for improved CD control and higher yield. The company will feature the product at both # A3-174.
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