NanoSpec 9300

NanoSpec 9300 is an automated, non-contact thin film metrology system designed for use in advanced 300 mm high-volume semiconductor manufacturing. An extension of Nanometrics' widely accepted NanoSpec 9000 platform, the NanoSpec 9300 is the only high-end standalone film metrology system equipped to handle the advanced materials and processes now being introduced into IC manufacturing.

The NanoSpec 9300 features a deep-ultraviolet (DUV) to near-infrared (NIR) spectroscopic ellipsometer (SE) with a wavelength range of 190-1000 nm for accurate and precise measurement of new processes and materials, such as very thin ONO film stacks, ARC films and photoresists for 193 nm lithography. This is the only production-worthy metrology system that measures directly at 193 nm using SE and utilizes Fourier transform infrared (FTIR) technology, an essential tool to determine the dopant concentration level in doped films such as CVD low-k dielectrics. Leading-edge robotic automation provides the industry's smallest footprint for a dual-FOUP (Front Opening Unified Pod) 300 mm system while offering high throughput. The layout of the system's software meets SEMI standard E95-0200, Specification for Human Interface for Semiconductor Manufacturing Equipment, which calls for a unified graphical user interface (GUI) that is easy to use and globally applicable. Based on Windows NT, the software also allows for seamless recipe transfer from the standalone system to Nanometrics' Integrated Metrology platforms. In addition, the NanoSpec 9300 offers a new, redesigned DUV to visible reflectometer with a cooled CCD array detector that provides excellent signal-to-noise ratios for improved measurement performance.

Nanometrics Inc, 310 Deguigne Drive, Sunnyvale, CA 94086-3906. Tel: 408-746-1600; Fax: 408-720-0196.