MKS' Low Pressure piMFC Controls Low Flow, Safe Delivery Source Gases

Wilmington, MA - MKS Instruments, Inc., a provider of process control technologies for improving productivity in semiconductor and other advanced manufacturing processes, has introduced the Low Pressure piMFC Mass Flow Controller for maximum utilization of Safe Delivery Source gases used in semiconductor ion implant applications.

According to the company:

• The controller offers accurate and precise control of low gas flows, from below 1 sccm up to 20 sccm, over a wide pressure range with source gas delivery pressure as low as 4 Torr.
• Implementation of the Low Pressure piMFC increases source gas utilization, reducing the frequency of source gas cylinder changes, improving tool uptime and COO.
• The piMFC's multi-gas, multi-range feature allows users to configure it for different primary implant gases such as arsine, phosphine, boron trifluoride and others, keeping inventory costs down.
• The piMFC operates with a very low pressure drop across the device. The patented valve and sensor designs offer exceptional zero stability and accuracy for all flow conditions while maintaining the ability to rapidly achieve setpoint and repeatably control the gas flow.
• Using its straightforward Ethernet interface and a PC, the embedded configuration and diagnostics software lets users check MFC functionality without removing the MFC.
• Standard-sized MFC footprint and control I/O are compatible with existing gas lines for easy integration and operation.

SOURCE: MKS Instruments, Inc.