News | January 13, 2005

MKS CirrusTM Atmospheric Pressure Gas Monitoring

On-line monitoring and analysis of trace contaminants in process gases

Wilmington, MA, 2005 —Cirrus™ Atmospheric Pressure Gas Monitoring system is ideal for the on-line monitoring and analysis of gases and gas mixtures including solvent vapors, hydrocarbons, inorganic gas species (including corrosives), freons and noble gases. Its compact design and flexible control front-end make the Cirrus system suitable for a broad range of applications.

MKS Instruments, Inc., (Nasdaq: MKSI), a leading provider of process control technologies for improving productivity in semiconductor and other advanced manufacturing processes, is pleased to introduce the Cirrus Atmospheric Pressure Gas Monitor for use in semiconductor applications such as contamination monitoring in bulk gas delivery systems. At the heart of every Cirrus system is a precision-built quadrupole analyzer incorporating a closed ion source, a triple mass filter and a dual (Faraday and Secondary Electron Multiplier) detector system. This analyzer configuration optimizes sensitivity and long-term stability performance. Use of the quadrupole analyzer enables monitoring of multiple gases at the same time over a wide dynamic range (from ppb to percentage levels).
The Cirrus gas monitoring system is fully automated and can be operated through a single Ethernet interface. MKS Process Eye ProfessionalTM software provides application-specific interpretation, control, and alarm functions, and allows correlation with data from other sensors. A silica capillary inlet provides rapid response, while an inert chamber and low-maintenance, automated bake-out and heating capability ensure low background contamination and prevent condensation during measurement.

Note to editors: To download a photo of the Cirrus Atmospheric Pressure Gas Monitor, please go to the MKS web site: http://www.mksinst.com/pressroom-photos.html..

About MKS
MKS Instruments is a leading worldwide provider of process control solutions for advanced manufacturing processes such as semiconductor device manufacturing and thin-film manufacturing for flat panel displays, optical storage media, architectural glass and electro-optical products. We also provide technology for medical imaging equipment.
Our instruments, components and subsystems incorporate sophisticated technologies to power, measure, control and monitor increasingly complex gas-related semiconductor manufacturing processes, thereby enhancing our customers' uptime, yield and throughput, and improving their productivity and return on invested capital.