MetaPULSE Metrology System
The MetaPULSE-II accomplishes these advances while achieving higher throughput and repeatability measurements. These capabilities are enhanced by the addition of a reflectometer capable of measuring the thickness of transparent ILD films and determining the reflectivity of anti-reflective coatings used in patterning dual-damascene lines and via structures. MetaPULSE-II also offers a smaller footprint and easier serviceability than the first generation MetaPULSE. First shipments of the MetaPULSE-II systems are planned for the third quarter of 2001.
The MetaPULSE-II incorporates significant advances based on experience gained by working directly with process engineers from logic, memory, and ASIC chip manufacturers around the world. Three years of customer-fab applications experience using over one hundred first-generation MetaPULSE systems in the field formed the foundation upon which this totally new, second-generation tool was engineered. Many of its new capabilities were developed specifically to handle the increased demands beyond the 0.13-µm generation semiconductor manufacturing. The tool features a new automation platform that will contribute to lower cost-of-ownership. Extendibility to next generation processes was a prime concern. Despite the smaller overall footprint, built-in expansion capabilities will allow it to serve as Rudolph's opaque film flagship metrology platform for many years to come.