Medium Current Ion Implanter
Source: Eaton Corp., Semiconductor Equipment Div.
The GSD/HEMC is a medium current ion implanter designed for low-tilt applications
Eaton Corp., Semiconductor Equipment Div.sub>MC is a medium current ion implanter designed for low-tilt applications. Based on the company's GSD/HE product platform, the implanter delivers sufficient beam currents to run at mechanical limits for all low-tilt medium current applications.
The implanter was developed to perform in engineering and voltage threshold adjust implants in the volume production of all devices, including logic, DRAM and flash memory chips. It features in situ quad capability and fast tune times to enable highly productive, chained implants. The lower energy range is sufficient for most retrograde well implants. This product can be field upgraded.
<%=company%>, 55 Cherry Hill Drive, Beverly, MA 01915-1053. Tel: 978-232-4000. Fax: 978-232-4200.
This website uses cookies to ensure you get the best experience on our website. Learn more