MC3 for 300 mm Medium Current Ion Implantation

Axcelis TechnologiesC3 medium current ion implanter is designed for 300 mm semiconductor manufacturing.

The implanter is a fully automated, serial processing medium current implanter. Its design, an evolution of the 8250HT, minimizes the risk associated with transitioning to 300 mm. A key feature of the device is the Angular Energy Filter, which delivers good beam purity over the entire energy range of 5 to 750 keV - for processing capability and enhanced device yield. The Angular Energy Filter can process Indium and other species on the same system. The implanter utilizes a Constant Focal Length wafer scanning system that keeps the ion beam's focal point equidistant at all points across the wafer, regardless of the chosen tilt angle.

A multi-tasking control system is designed to deliver good CoO and OEE performance in a production environment. The system allows uninterrupted production while editing recipes, accessing data or communicating with factory host systems. An integrated statistical process control capability provides exceptional control and allows for rapid yield optimization.

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